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Chemical conversion of MoS2 thin films deposited by atomic ..:
Patouillard, J
;
Gassilloud, R
;
Mercier, F
...
info:eu-repo/semantics/altIdentifier/doi/10.1116/6.0002678. , 2023
Link:
https://hal.science/hal-04189163
RT Journal T1 <Title>Chemical conversion of MoS2 thin films deposited by atomic layer deposition (ALD) into molybdenum nitride monitored by in situ reflectance measurements</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftccsdartic:oai:HAL:hal-04189163v1&Exemplar=1&LAN=DE A1 Patouillard, J A1 Gassilloud, R A1 Mercier, F A1 Mantoux, A A1 Boichot, R A1 Crisci, A A1 Bernard, M A1 Gauthier, N A1 Cadot, S A1 Raynaud, C A1 Gianesello, F A1 Blanquet, E PB HAL CCSD; American Vacuum Society YR 2023 K1 [CHIM.MATE]Chemical Sciences/Material chemistry JF info:eu-repo/semantics/altIdentifier/doi/10.1116/6.0002678 LK http://dx.doi.org/https://hal.science/hal-04189163 DO https://hal.science/hal-04189163 SF ELIB - SuUB Bremen
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