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DÉFAUTS INDUITS DANS Si PAR IMPLANTATION DIRECTE OU A TRAVE..:
Balland, B
;
Remaki, B
;
Pinard, P
.
info:eu-repo/semantics/altIdentifier/doi/10.1051/jphyscol:1983548. , 1983
Link:
https://hal.science/jpa-00223134
RT Journal T1 <Title>DÉFAUTS INDUITS DANS Si PAR IMPLANTATION DIRECTE OU A TRAVERS UNE COUCHE DE SiO2</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftccsdartic:oai:HAL:jpa-00223134v1&Exemplar=1&LAN=DE A1 Balland, B A1 Remaki, B A1 Pinard, P A1 Mercier, E PB HAL CCSD YR 1983 K1 [PHYS.HIST]Physics [physics]/Physics archives JF info:eu-repo/semantics/altIdentifier/doi/10.1051/jphyscol:1983548 LK http://dx.doi.org/https://hal.science/jpa-00223134 DO https://hal.science/jpa-00223134 SF ELIB - SuUB Bremen
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