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Holographic lithography for continuous-relief diffractive o..:
Hoffmann, Meike
;
Stoebenau, Sebastian
;
Teschke, Marcel
.
Information technology and electrical engineering - devices and systems, materials and technologies for the future -- 51. IWK, Internationales Wissenschaftliches Kolloquium. , 2009
Link:
https://www.db-thueringen.de/receive/dbt_mods_00013464
RT Journal T1 <Title>Holographic lithography for continuous-relief diffractive optical elements</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftdbthueringen:oai:www.db-thueringen.de:dbt_mods_00013464&Exemplar=1&LAN=DE A1 Hoffmann, Meike A1 Stoebenau, Sebastian A1 Teschke, Marcel A1 Sinzinger, Stefan YR 2009 K1 article K1 ScholarlyArticle K1 Klasse A K1 für Harvesting bereitgestellt K1 51. IWK (2006) K1 ddc:620 JF Information technology and electrical engineering - devices and systems, materials and technologies for the future -- 51. IWK, Internationales Wissenschaftliches Kolloquium LK http://dx.doi.org/https://www.db-thueringen.de/receive/dbt_mods_00013464 DO https://www.db-thueringen.de/receive/dbt_mods_00013464 SF ELIB - SuUB Bremen
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