I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
A study of imprint and etching behavior on fused silica of ..:
Si, Shuhao
;
Weigel, Christoph
;
Messerschmidt, Martin
...
Micro and nano engineering -- 2590-0072 -- 2965612-6 -- http://uri.gbv.de/document/gvk:ppn:106765058X -- https://www.sciencedirect.com/journal/micro-and-nano-engineering -- http://www.bibliothek.uni-regensburg.de/ezeit/?2965612. , 2020
Link:
https://doi.org/10.1016/j.mne.2020.100047
RT Journal T1 <Title>A study of imprint and etching behavior on fused silica of a new tailored resist mr-NIL213FC for soft UV-NIL</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftdbthueringen:oai:www.db-thueringen.de:dbt_mods_00043571&Exemplar=1&LAN=DE A1 Si, Shuhao A1 Weigel, Christoph A1 Messerschmidt, Martin A1 Thesen, Manuel W A1 Sinzinger, Stefan A1 Strehle, Steffen YR 2020 K1 article K1 ScholarlyArticle K1 ddc:620 K1 Soft UV NIL -- Nanofabrication -- PDMS stamp -- Glass etching -- High etching selectivity -- New resist JF Micro and nano engineering -- 2590-0072 -- 2965612-6 -- http://uri.gbv.de/document/gvk:ppn:106765058X -- https://www.sciencedirect.com/journal/micro-and-nano-engineering -- http://www.bibliothek.uni-regensburg.de/ezeit/?2965612 LK http://dx.doi.org/https://doi.org/10.1016/j.mne.2020.100047 DO https://doi.org/10.1016/j.mne.2020.100047 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)
