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Imprinting the polytype structure of silicon carbide by rap..:
Pezoldt, Jörg
;
Cimalla, Volker
Crystals -- 2073-4352 -- http://uri.gbv.de/document/gvk:ppn:718303067 -- 2661516-2 -- http://www.mdpi.com/journal/crystals -- http://www.bibliothek.uni-regensburg.de/ezeit/?2661516. , 2020
Link:
https://doi.org/10.3390/cryst10060523
RT Journal T1 <Title>Imprinting the polytype structure of silicon carbide by rapid thermal processing</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftdbthueringen:oai:www.db-thueringen.de:dbt_mods_00048163&Exemplar=1&LAN=DE A1 Pezoldt, Jörg A1 Cimalla, Volker YR 2020 K1 article K1 ScholarlyArticle K1 ddc:540 K1 silicon carbide -- rapid thermal processing -- ion-implantation -- epitaxy -- CVD -- sublimation -- polytypism -- phase transition -- polytype transition -- polytype control JF Crystals -- 2073-4352 -- http://uri.gbv.de/document/gvk:ppn:718303067 -- 2661516-2 -- http://www.mdpi.com/journal/crystals -- http://www.bibliothek.uni-regensburg.de/ezeit/?2661516 LK http://dx.doi.org/https://doi.org/10.3390/cryst10060523 DO https://doi.org/10.3390/cryst10060523 SF ELIB - SuUB Bremen
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