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Manufacturing of nanostructures with high aspect ratios usi..:
Handte, Thomas
;
Scheller, Nicolas
;
Dittrich, Lars
...
Micro and nano engineering -- 2590-0072 -- 2965612-6 -- http://uri.gbv.de/document/gvk:ppn:106765058X -- https://www.sciencedirect.com/journal/micro-and-nano-engineering -- http://www.bibliothek.uni-regensburg.de/ezeit/?2965612. , 2022
Link:
https://doi.org/10.1016/j.mne.2022.100106
RT Journal T1 <Title>Manufacturing of nanostructures with high aspect ratios using soft UV-nanoimprint lithography with bi- and trilayer resist systems</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftdbthueringen:oai:www.db-thueringen.de:dbt_mods_00057006&Exemplar=1&LAN=DE A1 Handte, Thomas A1 Scheller, Nicolas A1 Dittrich, Lars A1 Thesen, Manuel W A1 Messerschmidt, Martin A1 Sinzinger, Stefan YR 2022 K1 article K1 ScholarlyArticle K1 ddc:620 K1 Soft UV-NIL -- Nanofabrication -- High etch selectivity -- Bilayer -- Trilayer -- Lift-off -- Hard mask JF Micro and nano engineering -- 2590-0072 -- 2965612-6 -- http://uri.gbv.de/document/gvk:ppn:106765058X -- https://www.sciencedirect.com/journal/micro-and-nano-engineering -- http://www.bibliothek.uni-regensburg.de/ezeit/?2965612 LK http://dx.doi.org/https://doi.org/10.1016/j.mne.2022.100106 DO https://doi.org/10.1016/j.mne.2022.100106 SF ELIB - SuUB Bremen
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