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The Noise Behavior of Gap-Type Amorphous Silicon TFT Under ..:
Ya-Hsiang Tai
;
Yi-Cheng Yuan
;
Cheng-Che Tu
.
https://ieeexplore.ieee.org/document/9747923/. , 2022
Link:
https://doi.org/10.1109/JEDS.2022.3164082
RT Journal T1
The Noise Behavior of Gap-Type Amorphous Silicon TFT Under Illumination
UL https://suche.suub.uni-bremen.de/peid=base-ftdoajarticles:oai:doaj.org_article:26e252ff9c1b4efb9746367228740d0d&Exemplar=1&LAN=DE A1 Ya-Hsiang Tai A1 Yi-Cheng Yuan A1 Cheng-Che Tu A1 Pin-Chun Wang PB IEEE YR 2022 K1 Amorphous silicon K1 gap-type K1 thin-film transistors (TFTs) K1 noise K1 Electrical engineering. Electronics. Nuclear engineering K1 TK1-9971 JF https://ieeexplore.ieee.org/document/9747923/ LK http://dx.doi.org/https://doi.org/10.1109/JEDS.2022.3164082 DO https://doi.org/10.1109/JEDS.2022.3164082 SF ELIB - SuUB Bremen
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