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1 Ergebnisse
1
CMOS Compatible Plasmonic Refractive Index Sensor based on ..:
M. O. Faruque
;
R. Al Mahmud
;
R. H. Sagor
https://etasr.com/index.php/ETASR/article/view/3264. , 2020
Link:
https://doi.org/10.48084/etasr.3264
RT Journal T1
CMOS Compatible Plasmonic Refractive Index Sensor based on Heavily Doped Silicon Waveguide
UL https://suche.suub.uni-bremen.de/peid=base-ftdoajarticles:oai:doaj.org_article:446abe08e2314c108525436e5b02f5f4&Exemplar=1&LAN=DE A1 M. O. Faruque A1 R. Al Mahmud A1 R. H. Sagor PB D. G. Pylarinos YR 2020 K1 cmos technology K1 heavily doped silicon K1 metal-insulator-metal K1 ri sensor K1 Engineering (General). Civil engineering (General) K1 TA1-2040 K1 Technology (General) K1 T1-995 K1 Information technology K1 T58.5-58.64 JF https://etasr.com/index.php/ETASR/article/view/3264 LK http://dx.doi.org/https://doi.org/10.48084/etasr.3264 DO https://doi.org/10.48084/etasr.3264 SF ELIB - SuUB Bremen
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