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Chemical Vapor Deposition of Longitudinal Homogeneous Paryl..:
David Redka
;
Milan Buttberg
;
Gerhard Franz
https://www.mdpi.com/2227-9717/10/10/1982. , 2022
Link:
https://doi.org/10.3390/pr10101982
RT Journal T1
Chemical Vapor Deposition of Longitudinal Homogeneous Parylene Thin-Films inside Narrow Tubes
UL https://suche.suub.uni-bremen.de/peid=base-ftdoajarticles:oai:doaj.org_article:753b22a6f45c461aa0a0e8de93fb153e&Exemplar=1&LAN=DE A1 David Redka A1 Milan Buttberg A1 Gerhard Franz PB MDPI AG YR 2022 K1 parylene K1 chemical vapor deposition K1 deposition model K1 constant film thickness K1 sticking coefficient K1 temperature gradient K1 Chemical technology K1 TP1-1185 K1 Chemistry K1 QD1-999 JF https://www.mdpi.com/2227-9717/10/10/1982 LK http://dx.doi.org/https://doi.org/10.3390/pr10101982 DO https://doi.org/10.3390/pr10101982 SF ELIB - SuUB Bremen
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