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Heterogeneous integration of high-k complex-oxide gate diel..:
Jongho Ji
;
Jeong Yong Yang
;
Sangho Lee
...
https://doi.org/10.1038/s44172-024-00161-z. , 2024
Link:
https://doi.org/10.1038/s44172-024-00161-z
RT Journal T1 <Title>Heterogeneous integration of high-k complex-oxide gate dielectrics on wide band-gap high-electron-mobility transistors</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftdoajarticles:oai:doaj.org_article:cf3547738b2a4a989d8856bc549b8e72&Exemplar=1&LAN=DE A1 Jongho Ji A1 Jeong Yong Yang A1 Sangho Lee A1 Seokgi Kim A1 Min Jae Yeom A1 Gyuhyung Lee A1 Heechang Shin A1 Sang-Hoon Bae A1 Jong-Hyun Ahn A1 Sungkyu Kim A1 Jeehwan Kim A1 Geonwook Yoo A1 Hyun S. Kum PB Nature Portfolio YR 2024 K1 Engineering (General). Civil engineering (General) K1 TA1-2040 JF https://doi.org/10.1038/s44172-024-00161-z LK http://dx.doi.org/https://doi.org/10.1038/s44172-024-00161-z DO https://doi.org/10.1038/s44172-024-00161-z SF ELIB - SuUB Bremen
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