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Kinetics of growth of thin-films of Co2Si, Ni2Si, WSi2 and ..:
S.O. Akintunde
;
P.A. Selyshchev
http://www.sciencedirect.com/science/article/pii/S2211379716000073. , 2016
Link:
https://doi.org/10.1016/j.rinp.2016.01.006
RT Journal T1 <Title>Kinetics of growth of thin-films of Co2Si, Ni2Si, WSi2 and VSi2 during a reactive diffusion process</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftdoajarticles:oai:doaj.org_article:d1ac5b84b25b495c97e612c4dcd96e0d&Exemplar=1&LAN=DE A1 S.O. Akintunde A1 P.A. Selyshchev PB Elsevier YR 2016 K1 Physics K1 QC1-999 JF http://www.sciencedirect.com/science/article/pii/S2211379716000073 LK http://dx.doi.org/https://doi.org/10.1016/j.rinp.2016.01.006 DO https://doi.org/10.1016/j.rinp.2016.01.006 SF ELIB - SuUB Bremen
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