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Atmospheric pressure chemical vapor deposition of indium ox..:
T.M. Aper
;
F.K. Yam
;
K.G. Saw
..
http://www.sciencedirect.com/science/article/pii/S221137972100334X. , 2021
Link:
https://doi.org/10.1016/j.rinp.2021.104187
RT Journal T1 <Title>Atmospheric pressure chemical vapor deposition of indium oxide nanostructured films for photoelectrochemical application</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftdoajarticles:oai:doaj.org_article:d72559f585734097bea19417d7be287f&Exemplar=1&LAN=DE A1 T.M. Aper A1 F.K. Yam A1 K.G. Saw A1 Khi Poay Beh A1 Khaled M. Chahrour PB Elsevier YR 2021 K1 Indium oxide nanostructures K1 Photoelectrochemical performance K1 Chemical vapor deposition K1 Physics K1 QC1-999 JF http://www.sciencedirect.com/science/article/pii/S221137972100334X LK http://dx.doi.org/https://doi.org/10.1016/j.rinp.2021.104187 DO https://doi.org/10.1016/j.rinp.2021.104187 SF ELIB - SuUB Bremen
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