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Atomic Layer Deposition of Boron‐Doped Al2O3 Dielectric Fil..:
Xinzhi Li
;
Marko Vehkamäki
;
Mykhailo Chundak
...
https://doi.org/10.1002/admi.202300173. , 2023
Link:
https://doi.org/10.1002/admi.202300173
RT Journal T1
Atomic Layer Deposition of Boron‐Doped Al2O3 Dielectric Films
UL https://suche.suub.uni-bremen.de/peid=base-ftdoajarticles:oai:doaj.org_article:fa8a24ac350e4037885909bda389a47c&Exemplar=1&LAN=DE A1 Xinzhi Li A1 Marko Vehkamäki A1 Mykhailo Chundak A1 Kenichiro Mizohata A1 Anton Vihervaara A1 Markku Leskelä A1 Matti Putkonen A1 Mikko Ritala PB Wiley-VCH YR 2023 K1 atomic layer deposition K1 dielectric constant K1 doped Al2O3 K1 Physics K1 QC1-999 K1 Technology K1 T JF https://doi.org/10.1002/admi.202300173 LK http://dx.doi.org/https://doi.org/10.1002/admi.202300173 DO https://doi.org/10.1002/admi.202300173 SF ELIB - SuUB Bremen
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