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1 Ergebnisse
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Maskless and contactless patterned silicon deposition using..:
Leal, Ronan
;
Bruneau, Bastien
;
Bulkin, Pavel
...
info:eu-repo/semantics/altIdentifier/doi/10.1088/1361-6595/ab5e2c. , 2020
Link:
https://hal.science/hal-02545248
RT Journal T1 <Title>Maskless and contactless patterned silicon deposition using a localized PECVD process</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftepunivpsaclay:oai:HAL:hal-02545248v1&Exemplar=1&LAN=DE A1 Leal, Ronan A1 Bruneau, Bastien A1 Bulkin, Pavel A1 Novikova, Tatiana A1 Silva, François A1 Habka, Nada A1 Johnson, Erik PB HAL CCSD; IOP Publishing YR 2020 K1 PECVD K1 patterning K1 selective K1 hollow cathode K1 silicon K1 [SPI.PLASMA]Engineering Sciences [physics]/Plasmas JF info:eu-repo/semantics/altIdentifier/doi/10.1088/1361-6595/ab5e2c LK http://dx.doi.org/https://hal.science/hal-02545248 DO https://hal.science/hal-02545248 SF ELIB - SuUB Bremen
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