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Reliability Study of 1T1C FeRAM Arrays with Hf0.5Zr0.5O2 Th..:
Okuno, J
;
Kunihiro, T
;
Konishi, K
...
IEEE journal of the Electron Devices Society : J-EDS. , 2022
Link:
https://publica.fraunhofer.de/handle/publica/434478
RT Journal T1
Reliability Study of 1T1C FeRAM Arrays with Hf0.5Zr0.5O2 Thickness Scaling
UL https://suche.suub.uni-bremen.de/peid=base-ftfrauneprints:oai:publica.fraunhofer.de:publica_434478&Exemplar=1&LAN=DE A1 Okuno, J A1 Kunihiro, T A1 Konishi, K A1 Shuto, Y A1 Sugaya, F A1 Materano, M A1 Ali, Tarek Nadi Ismail A1 Lederer, Maximilian A1 Kuehnel, Kati A1 Seidel, Konrad A1 Mikolajick, T A1 Schroeder, U A1 Tsukamoto, M A1 Umebayashi, T YR 2022 K1 Capacitor K1 Capacitors K1 Dielectric breakdown K1 Ferroelectric films K1 Ferroelectric random-access memory K1 Hafnium oxide K1 Nonvolatile memory K1 Random access memory K1 Thickness scaling K1 Transistors K1 Zirconium K1 Zirconium oxide JF IEEE journal of the Electron Devices Society : J-EDS LK http://dx.doi.org/https://publica.fraunhofer.de/handle/publica/434478 DO https://publica.fraunhofer.de/handle/publica/434478 SF ELIB - SuUB Bremen
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