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1 Ergebnisse
1
Thermal Atomic Layer Etching of Molybdenum Using Sequential..:
Taewook Nam
;
Troy A. Colleran
;
Jonathan L. Partridge
..
doi:10.1021/acs.chemmater.3c02606.s001. , 2024
Link:
https://doi.org/10.1021/acs.chemmater.3c02606.s001
RT Journal T1
Thermal Atomic Layer Etching of Molybdenum Using Sequential Oxidation and Deoxychlorination Reactions
UL https://suche.suub.uni-bremen.de/peid=base-ftgriffithunifig:oai:figshare.com:article_25104037&Exemplar=1&LAN=DE A1 Taewook Nam A1 Troy A. Colleran A1 Jonathan L. Partridge A1 Andrew S. Cavanagh A1 Steven M. George YR 2024 K1 Medicine K1 Microbiology K1 Cell Biology K1 Biotechnology K1 Evolutionary Biology K1 Marine Biology K1 Infectious Diseases K1 Computational Biology K1 Environmental Sciences not elsewhere classified K1 Biological Sciences not elsewhere classified K1 Chemical Sciences not elsewhere classified K1 Physical Sciences not elsewhere classified K1 ray photoelectron spectroscopy K1 pronounced mass increase K1 atomic force microscopy K1 250 ° c K1 225 ° c K1 200 ° c K1 150 ° c K1 thionyl chloride ) K1 short etching delay K1 coated qcm crystals K1 3 </ sub K1 2 </ sub K1 mcpc increased slightly K1 mo etch rates K1 qcm results revealed K1 mo ale displayed K1 resolved qms studies K1 etch mo K1 sulfuryl chloride K1 results indicate K1 measurements revealed K1 etching temperature K1 sputtered mo K1 mo surface K1 mo ale K1 soft saturation K1 saturation conditions K1 reaction mechanism K1 qms studies K1 limited oxidation K1 donates chlorine K1 deoxychlorination reactions K1 deoxychlorination reaction K1 deoxychlorination reactant K1 ale cycles K1 accepts oxygen K1 98 å JF doi:10.1021/acs.chemmater.3c02606.s001 LK http://dx.doi.org/https://doi.org/10.1021/acs.chemmater.3c02606.s001 DO https://doi.org/10.1021/acs.chemmater.3c02606.s001 SF ELIB - SuUB Bremen
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