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A simple solution method to prepare VO2:Co2+ precursors for..:
Hernandez-Guzman, F
;
Suarez Campos, Guillermo
;
Cabrera-German, D
...
https://biotecnia.unison.mx/index.php/biotecnia/article/view/1886/855. , 2023
Link:
https://biotecnia.unison.mx/index.php/biotecnia/articl..
RT Journal T1
A simple solution method to prepare VO2:Co2+ precursors for thin film deposition by solution-processing method: A simple solution method to prepare VO2:Co2+ ; Un método simple de solución para preparar precursores de VO2:Co2+ para la deposición de película delgada mediante el método de procesamiento en solución: Un método simple de solución para preparar películas delgadas de VO2:Co2+
UL https://suche.suub.uni-bremen.de/peid=base-ftjbiotecnica:oai:oai.biotecnia.unison.mx:article_1886&Exemplar=1&LAN=DE A1 Hernandez-Guzman, F A1 Suarez Campos, Guillermo A1 Cabrera-German, D A1 Milan-Franco, MA A1 Hu, H A1 Quevedo-Lopez, MA A1 Sotelo-Lerma, M PB Universidad de Sonora YR 2023 K1 cobalt doped vanadium oxide K1 spin-coated thin films K1 porous morphology K1 solution processing without ligands K1 oxido de vanadio dopado con cobalto K1 películas delgadas mediante recubrimiento centrifugo K1 morfología porosa K1 procesamiento de la solución sin complejantes JF https://biotecnia.unison.mx/index.php/biotecnia/article/view/1886/855 LK http://dx.doi.org/https://biotecnia.unison.mx/index.php/biotecnia/article/view/1886 DO https://biotecnia.unison.mx/index.php/biotecnia/article/view/1886 SF ELIB - SuUB Bremen
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