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1 Ergebnisse
1
STUDY OF CRYSTALLINITY PARAMETER DISTRIBUTION FOR mc-Si FIL..:
V. L. Koshevoi
;
A. O. Belorus
;
V. S. Levitskiy
...
https://www.isjaee.com/jour/article/view/173/176. , 2015
Link:
https://www.isjaee.com/jour/article/view/173
RT Journal T1
STUDY OF CRYSTALLINITY PARAMETER DISTRIBUTION FOR mc-Si FILMS, OBTAINED BY PECVD, BY USING RAMAN SPECTROSCOPY ; ИССЛЕДОВАНИЕ РАСПРЕДЕЛЕНИЯ ПАРАМЕТРА КРИСТАЛЛИЧНОСТИ ДЛЯ ПЛЁНОК mc-Si, ПОЛУЧЕННЫХ МЕТОДОМ PECVD, С ПОМОЩЬЮ РАМАНОВСКОЙ СПЕКТРОСКОПИИ
UL https://suche.suub.uni-bremen.de/peid=base-ftjisjaee:oai:oai.alternative.elpub.ru:article_173&Exemplar=1&LAN=DE A1 V. L. Koshevoi A1 A. O. Belorus A1 V. S. Levitskiy A1 В. Л. Кошевой A1 А. О. Белорус A1 В. С. Левицкий PB Международный издательский дом научной периодики "Спейс YR 2015 K1 рамановская спектроскопия K1 microcrystalline silicon K1 plasma chemical deposition parameter crystallinity K1 Raman spectroscopy K1 микрокристаллический кремний K1 плазмохимическое осаждение K1 параметр кристалличности JF https://www.isjaee.com/jour/article/view/173/176 LK http://dx.doi.org/https://www.isjaee.com/jour/article/view/173 DO https://www.isjaee.com/jour/article/view/173 SF ELIB - SuUB Bremen
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