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1 Ergebnisse
1
Application of Al2O3 film for stabilization of charge prope..:
A. S. Kim
;
N. A. Serko
;
P. E. Khakuashev
...
https://met.misis.ru/jour/article/view/515/424. , 2023
Link:
https://met.misis.ru/jour/article/view/515
RT Journal T1
Application of Al2O3 film for stabilization of charge properties of the SiO2/p-Si interface ; Применение пленки Al2O3 для стабилизации зарядовых свойств границы раздела SiO2/p-Si
UL https://suche.suub.uni-bremen.de/peid=base-ftjmee:oai:oai.mateltech.elpub.ru:article_515&Exemplar=1&LAN=DE A1 A. S. Kim A1 N. A. Serko A1 P. E. Khakuashev A1 A. N. Kolky A1 S. Yu. Yurchuk A1 А. С. Ким A1 Н. А. Серко A1 П. Е. Хакуашев A1 А. Н. Колкий A1 С. Ю. Юрчук PB MISiS YR 2023 K1 диэлектрическая пленка Al2O3 K1 passivation K1 SiO2/p-Si interface K1 dielectric film Al2O3 K1 пассивация K1 граница раздела SiO2/p-Si JF https://met.misis.ru/jour/article/view/515/424 LK http://dx.doi.org/https://met.misis.ru/jour/article/view/515 DO https://met.misis.ru/jour/article/view/515 SF ELIB - SuUB Bremen
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