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Phase control of Al2O3 thin films grown at low temperatures:
Andersson, Jon Martin
;
Wallin, Erik
;
Helmersson, Ulf
..
Thin Solid Films, 0040-6090, 2006, 513:1-2, s. 57-59. , 2006
Link:
http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-14318
RT Journal T1
Phase control of Al2O3 thin films grown at low temperatures
UL https://suche.suub.uni-bremen.de/peid=base-ftlinkoepinguniv:oai:DiVA.org:liu-14318&Exemplar=1&LAN=DE A1 Andersson, Jon Martin A1 Wallin, Erik A1 Helmersson, Ulf A1 Kreissig, U A1 Münger, E. Peter PB Linköpings universitet, Plasma och beläggningsfysik; Linköpings universitet, Tekniska högskolan; Linköpings universitet, Teoretisk Fysik; Institute for Ion Beam Physics and Materials Research, Forschungszentrum Rossendorf, PF 510119, D-01314 Dresden, Germany; Elsevier YR 2006 K1 Aluminum oxide K1 Chromium oxide K1 Sputtering K1 Ion bombardment K1 X-ray diffraction K1 Physical Sciences K1 Fysik JF Thin Solid Films, 0040-6090, 2006, 513:1-2, s. 57-59 LK http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-14318 DO http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-14318 SF ELIB - SuUB Bremen
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