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1 Ergebnisse
1
Etching Characteristics and Changes in Surface Properties o..:
Chea-Young Lee
;
Young-Hee Joo
;
Minsoo P. Kim
..
Surface Characterization, Deposition and Modification. , 2021
Link:
https://doi.org/10.3390/coatings11080906
RT Journal T1
Etching Characteristics and Changes in Surface Properties of IGZO Thin Films by O2 Addition in CF4/Ar Plasma
UL https://suche.suub.uni-bremen.de/peid=base-ftmdpi:oai:mdpi.com:_2079-6412_11_8_906_&Exemplar=1&LAN=DE A1 Chea-Young Lee A1 Young-Hee Joo A1 Minsoo P. Kim A1 Doo-Seung Um A1 Chang-Il Kim PB Multidisciplinary Digital Publishing Institute YR 2021 K1 IGZO K1 adaptively coupled plasma (ACP) K1 OES K1 XPS K1 etch rate K1 UPS K1 work function K1 adhesion JF Surface Characterization, Deposition and Modification LK http://dx.doi.org/https://doi.org/10.3390/coatings11080906 DO https://doi.org/10.3390/coatings11080906 SF ELIB - SuUB Bremen
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