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The Effect of RF Sputtering Conditions on the Physical Char..:
Cao Phuong Thao
;
Dong-Hau Kuo
;
Thi Tran Anh Tuan
...
https://dx.doi.org/10.3390/coatings9100645. , 2019
Link:
https://doi.org/10.3390/coatings9100645
RT Journal T1
The Effect of RF Sputtering Conditions on the Physical Characteristics of Deposited GeGaN Thin Film
UL https://suche.suub.uni-bremen.de/peid=base-ftmdpi:oai:mdpi.com:_2079-6412_9_10_645_&Exemplar=1&LAN=DE A1 Cao Phuong Thao A1 Dong-Hau Kuo A1 Thi Tran Anh Tuan A1 Kim Anh Tuan A1 Nguyen Hoang Vu A1 Thach Thi Via Sa Na A1 Khau Van Nhut A1 Nguyen Van Sau PB Multidisciplinary Digital Publishing Institute YR 2019 K1 Ge donor K1 GaN K1 growth condition K1 heating substrate temperature K1 RF power K1 reactive sputtering K1 thin film property JF https://dx.doi.org/10.3390/coatings9100645 LK http://dx.doi.org/https://doi.org/10.3390/coatings9100645 DO https://doi.org/10.3390/coatings9100645 SF ELIB - SuUB Bremen
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