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1 Ergebnisse
1
ALD-grown seed layers for electrochemical copper deposition..:
Waechtler, Thomas
;
Ding, Shao-Feng
;
Hofmann, Lutz
...
urn:nbn:de:bsz:ch1-qucosa-68040. , 2011
Link:
https://nbn-resolving.org/urn:nbn:de:bsz:ch1-qucosa-68..
RT Journal T1
ALD-grown seed layers for electrochemical copper deposition integrated with different diffusion barrier systems
UL https://suche.suub.uni-bremen.de/peid=base-ftmonarchchem:oai:qucosa:de:qucosa:19503&Exemplar=1&LAN=DE A1 Waechtler, Thomas A1 Ding, Shao-Feng A1 Hofmann, Lutz A1 Mothes, Robert A1 Xie, Qi A1 Oswald, Steffen A1 Detavernier, Christophe A1 Schulz, Stefan E A1 Qu, Xin-Ping A1 Lang, Heinrich A1 Gessner, Thomas PB Elsevier B.V. YR 2011 K1 info:eu-repo/classification/ddc/600 K1 ddc:600 K1 info:eu-repo/classification/ddc/620 K1 ddc:620 K1 info:eu-repo/classification/ddc/621 K1 ddc:621 K1 Beschichten K1 Verkupferung K1 Atomlagenabscheidung K1 Ruthenium K1 Kupfer K1 Metallisieren K1 Leiterbahn K1 ULSI K1 ALD K1 Kupferoxid K1 Keimschicht K1 Reduktion K1 Galvanik K1 Kupferbeschichtung K1 Metallisierung K1 Leitbahnsystem K1 Galvanisieren K1 Atomic layer deposition K1 Copper oxide K1 Reduction K1 Seed layer K1 Copper K1 Electrochemical deposition K1 ECD K1 Interconnect JF urn:nbn:de:bsz:ch1-qucosa-68040 LK http://dx.doi.org/https://nbn-resolving.org/urn:nbn:de:bsz:ch1-qucosa-68040 DO https://nbn-resolving.org/urn:nbn:de:bsz:ch1-qucosa-68040 SF ELIB - SuUB Bremen
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