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Arreglo de microelectrodos planares con procesos CMOS están..:
BLANCA SUSANA SOTO CRUZ
;
CARLOS ZUÑIGA ISLAS
citation:López, F., et al., (2011). Arreglo de microelectrodos planares con procesos CMOS estándar (Semiconductor Complementario Metal-Oxido), Información Tecnológica, Vol. 22 (3): 115-124. , 2011
Link:
http://inaoe.repositorioinstitucional.mx/jspui/handle/..
RT Journal T1
Arreglo de microelectrodos planares con procesos CMOS estándar (Semiconductor Complementario Metal-Oxido)
UL https://suche.suub.uni-bremen.de/peid=base-ftrepnacmexico:oai:inaoe.repositorioinstitucional.mx:1009_1834&Exemplar=1&LAN=DE A1 BLANCA SUSANA SOTO CRUZ A1 CARLOS ZUÑIGA ISLAS PB Información Tecnológica YR 2011 K1 info:eu-repo/classification/CMOS/CMOS K1 info:eu-repo/classification/Microelectrodo/Microelectrodo K1 info:eu-repo/classification/Compuerta de transmisión/Compuerta de transmisión K1 info:eu-repo/classification/Bipotenciales/Bipotenciales K1 info:eu-repo/classification/Filtro pasabanda/Filtro pasabanda K1 info:eu-repo/classification/Microelectrode/Microelectrode K1 info:eu-repo/classification/Transmission gate/Transmission gate K1 info:eu-repo/classification/Biopotentials/Biopotentials K1 info:eu-repo/classification/Passband filter/Passband filter K1 info:eu-repo/classification/cti/1 K1 info:eu-repo/classification/cti/22 K1 info:eu-repo/classification/cti/2203 JF citation:López, F., et al., (2011). Arreglo de microelectrodos planares con procesos CMOS estándar (Semiconductor Complementario Metal-Oxido), Información Tecnológica, Vol. 22 (3): 115-124 LK http://inaoe.repositorioinstitucional.mx/jspui/handle/1009/1834 DO http://inaoe.repositorioinstitucional.mx/jspui/handle/1009/1834 SF ELIB - SuUB Bremen
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