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1 Ergebnisse
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Stable Subloop Behavior in Ferroelectric Si-Doped HfO2:
Lee, Kyoungjun
;
Lee, Hyun-Jae
;
Lee, Tae Yoon
...
ACS Applied Materials and Interfaces, Vol.11 No.42, pp.38929-38936. , 2020
Link:
https://hdl.handle.net/10371/190835
RT Journal T1 <Title>Stable Subloop Behavior in Ferroelectric Si-Doped HfO2</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftseoulnuniv:oai:s-space.snu.ac.kr:10371_190835&Exemplar=1&LAN=DE A1 Lee, Kyoungjun A1 Lee, Hyun-Jae A1 Lee, Tae Yoon A1 Lim, Hong Heon A1 Song, Myeonl Seop A1 Yoo, Hyang Keun A1 Suh, Dong Ik A1 Lee, Jae Gil A1 Zhu, Zhongwei A1 Yoon, Alexander A1 MacDonald, Matthew R A1 Lei, Xinjian A1 Park, Kunwoo A1 Park, Jungwon A1 Lee, Jun Hee A1 Chae, Seung Chul PB American Chemical Society YR 2020 K1 RETENTION LOSS K1 DYNAMICS K1 MECHANISMS K1 FIELD K1 FeRAM K1 ferroelectric K1 multilevel K1 analogue device K1 HfO2 JF ACS Applied Materials and Interfaces, Vol.11 No.42, pp.38929-38936 LK http://dx.doi.org/https://hdl.handle.net/10371/190835 DO https://hdl.handle.net/10371/190835 SF ELIB - SuUB Bremen
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