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1 Ergebnisse
1
Application of a New Cl-Plasma-Treated Ag/AgCl Reference El..:
Park, Se-Ik
;
Jun, Sang Beom
;
Park, Sejin
..
IEEE Sensors Journal, vol. 3, pp. 267-273, 2003. , 2003
Link:
https://hdl.handle.net/10371/7841
RT Journal T1
Application of a New Cl-Plasma-Treated Ag/AgCl Reference Electrode to Micromachined Glucose Sensor
UL https://suche.suub.uni-bremen.de/peid=base-ftseoulnuniv:oai:s-space.snu.ac.kr:10371_7841&Exemplar=1&LAN=DE A1 Park, Se-Ik A1 Jun, Sang Beom A1 Park, Sejin A1 Kim, Hee Chan A1 Kim, Sung June PB Institute of Electrical and Electronics Engineers (IEEE) YR 2003 K1 Mass production K1 micromachined glucose sensor K1 monolithic integration K1 plasma-treated Ag/AgCl reference electrode K1 potential drift JF IEEE Sensors Journal, vol. 3, pp. 267-273, 2003 LK http://dx.doi.org/https://hdl.handle.net/10371/7841 DO https://hdl.handle.net/10371/7841 SF ELIB - SuUB Bremen
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