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Oxygen Recombination Probability Data for Plasma-Assisted A..:

Karsten Arts (7586228) ; Sanne Deijkers (10573062) ; Riikka L. Puurunen (7586234)..
https://figshare.com/articles/journal_contribution/Oxygen_Recombination_Probability_Data_for_Plasma-Assisted_Atomic_Layer_Deposition_of_SiO_sub_2_sub_and_TiO_sub_2_sub_/14388213. , 2021

Link: https://doi.org/10.1021/acs.jpcc.1c01505.s001

RT Journal
T1 <Title>Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO 2 and TiO 2</Title>

UL https://suche.suub.uni-bremen.de/peid=base-ftsmithonian:oai:figshare.com:article_14388213&Exemplar=1&LAN=DE
				
A1 Karsten Arts (7586228)
A1 Sanne Deijkers (10573062)
A1 Riikka L. Puurunen (7586234)
A1 Wilhelmus M. M. Kessels (7586237)
A1 Harm C. M. Knoops (7586240)
YR 2021
K1 Biochemistry
K1 Medicine
K1 Biotechnology
K1 Cancer
K1 Hematology
K1 Infectious Diseases
K1 Chemical Sciences not elsewhere classified
K1 surface recombination probability r
K1 Plasma-Assisted Atomic Layer Deposition
K1 process conditions
K1 conformality
K1 plasma ALD throughput
K1 Oxygen Recombination Probability Data
K1 substrate
K1 TiO 2 Atomic layer deposition
K1 plasma ALD
K1 radical
K1 AR values
K1 film
K1 SiO 2
JF https://figshare.com/articles/journal_contribution/Oxygen_Recombination_Probability_Data_for_Plasma-Assisted_Atomic_Layer_Deposition_of_SiO_sub_2_sub_and_TiO_sub_2_sub_/14388213
LK http://dx.doi.org/https://doi.org/10.1021/acs.jpcc.1c01505.s001
DO https://doi.org/10.1021/acs.jpcc.1c01505.s001
SF ELIB - SuUB Bremen

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