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Plasma-Enhanced Atomic Layer Deposition of p‑Type Copper Ox..:

Julia D. Lenef (10693171) ; Jaesung Jo (1571974) ; Orlando Trejo (1466356)...
https://figshare.com/articles/journal_contribution/Plasma-Enhanced_Atomic_Layer_Deposition_of_p_Type_Copper_Oxide_Semiconductors_with_Tunable_Phase_Oxidation_State_and_Morphology/14478151. , 2021

Link: https://doi.org/10.1021/acs.jpcc.1c00429.s001

RT Journal
T1 <Title>Plasma-Enhanced Atomic Layer Deposition of p‑Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology</Title>

UL https://suche.suub.uni-bremen.de/peid=base-ftsmithonian:oai:figshare.com:article_14478151&Exemplar=1&LAN=DE
				
A1 Julia D. Lenef (10693171)
A1 Jaesung Jo (1571974)
A1 Orlando Trejo (1466356)
A1 David J. Mandia (1441546)
A1 Rebecca L. Peterson (1305936)
A1 Neil P. Dasgupta (1437859)
YR 2021
K1 Medicine
K1 Biotechnology
K1 Science Policy
K1 Space Science
K1 Environmental Sciences not elsewhere classified
K1 Chemical Sciences not elsewhere classified
K1 Physical Sciences not elsewhere classified
K1 ratio
K1 p-type semiconductor behavior
K1 plasma
K1 copper oxidation states
K1 Synchrotron X-ray absorption spectr
K1 p-type CuO x
K1 nonfluorinated copper amidinate pre
K1 copper oxidation state
K1 relationship
K1 Plasma-Enhanced Atomic Layer Deposition
K1 Cu 2 O
K1 film
K1 grain size
K1 Morphology Metal oxide semiconductors
K1 phase
K1 PE-ALD
K1 annealing
K1 TFT
JF https://figshare.com/articles/journal_contribution/Plasma-Enhanced_Atomic_Layer_Deposition_of_p_Type_Copper_Oxide_Semiconductors_with_Tunable_Phase_Oxidation_State_and_Morphology/14478151
LK http://dx.doi.org/https://doi.org/10.1021/acs.jpcc.1c00429.s001
DO https://doi.org/10.1021/acs.jpcc.1c00429.s001
SF ELIB - SuUB Bremen

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