Titel

Merkliste
1 Ergebnisse

Area-Selective Atomic Layer Deposition of Ruthenium Using a..:

Hye-Mi Kim (9307187) ; Jung-Hoon Lee (770126) ; Seung-Hwan Lee (231008)...
https://figshare.com/articles/journal_contribution/Area-Selective_Atomic_Layer_Deposition_of_Ruthenium_Using_a_Novel_Ru_Precursor_and_H_sub_2_sub_O_as_a_Reactant/14770857. , 2021

Link: https://doi.org/10.1021/acs.chemmater.0c04496.s001

RT Journal
T1 <Title>Area-Selective Atomic Layer Deposition of Ruthenium Using a Novel Ru Precursor and H 2 O as a Reactant</Title>

UL https://suche.suub.uni-bremen.de/peid=base-ftsmithonian:oai:figshare.com:article_14770857&Exemplar=1&LAN=DE
				
A1 Hye-Mi Kim (9307187)
A1 Jung-Hoon Lee (770126)
A1 Seung-Hwan Lee (231008)
A1 Ryosuke Harada (2510902)
A1 Toshiyuki Shigetomi (2710612)
A1 Seungjoon Lee (2094892)
A1 Tomohiro Tsugawa (10959930)
A1 Bonggeun Shong (1291524)
A1 Jin-Seong Park (1534228)
YR 2021
K1 Biochemistry
K1 Cell Biology
K1 Biotechnology
K1 Evolutionary Biology
K1 Developmental Biology
K1 Cancer
K1 Inorganic Chemistry
K1 Infectious Diseases
K1 Computational Biology
K1 Environmental Sciences not elsewhere classified
K1 Chemical Sciences not elsewhere classified
K1 Physical Sciences not elsewhere classified
K1 O 2 reactant
K1 Auger electron spectroscopy mapping
K1 future semiconductor processing
K1 SiO 2 substrate
K1 exhibits ALD saturation
K1 Al 2 O 3
K1 Area-Selective Atomic Layer Deposition
K1 deposition
K1 Novel Ru Precursor
K1 diffusion barrier layer
K1 Ruthenium
K1 H 2 O
K1 film growth preference
K1 O 2
K1 H 2 O reactant
K1 surface
K1 SiO 2
JF https://figshare.com/articles/journal_contribution/Area-Selective_Atomic_Layer_Deposition_of_Ruthenium_Using_a_Novel_Ru_Precursor_and_H_sub_2_sub_O_as_a_Reactant/14770857
LK http://dx.doi.org/https://doi.org/10.1021/acs.chemmater.0c04496.s001
DO https://doi.org/10.1021/acs.chemmater.0c04496.s001
SF ELIB - SuUB Bremen

Export

RefWorks (nur Desktop-Version!)
Flow (Zuerst in Flow einloggen, dann importieren)