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1 Ergebnisse
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Area-Selective Atomic Layer Deposition of Ruthenium Using a..:
Hye-Mi Kim (9307187)
;
Jung-Hoon Lee (770126)
;
Seung-Hwan Lee (231008)
...
https://figshare.com/articles/journal_contribution/Area-Selective_Atomic_Layer_Deposition_of_Ruthenium_Using_a_Novel_Ru_Precursor_and_H_sub_2_sub_O_as_a_Reactant/14770857. , 2021
Link:
https://doi.org/10.1021/acs.chemmater.0c04496.s001
RT Journal T1
Area-Selective Atomic Layer Deposition of Ruthenium Using a Novel Ru Precursor and H 2 O as a Reactant
UL https://suche.suub.uni-bremen.de/peid=base-ftsmithonian:oai:figshare.com:article_14770857&Exemplar=1&LAN=DE A1 Hye-Mi Kim (9307187) A1 Jung-Hoon Lee (770126) A1 Seung-Hwan Lee (231008) A1 Ryosuke Harada (2510902) A1 Toshiyuki Shigetomi (2710612) A1 Seungjoon Lee (2094892) A1 Tomohiro Tsugawa (10959930) A1 Bonggeun Shong (1291524) A1 Jin-Seong Park (1534228) YR 2021 K1 Biochemistry K1 Cell Biology K1 Biotechnology K1 Evolutionary Biology K1 Developmental Biology K1 Cancer K1 Inorganic Chemistry K1 Infectious Diseases K1 Computational Biology K1 Environmental Sciences not elsewhere classified K1 Chemical Sciences not elsewhere classified K1 Physical Sciences not elsewhere classified K1 O 2 reactant K1 Auger electron spectroscopy mapping K1 future semiconductor processing K1 SiO 2 substrate K1 exhibits ALD saturation K1 Al 2 O 3 K1 Area-Selective Atomic Layer Deposition K1 deposition K1 Novel Ru Precursor K1 diffusion barrier layer K1 Ruthenium K1 H 2 O K1 film growth preference K1 O 2 K1 H 2 O reactant K1 surface K1 SiO 2 JF https://figshare.com/articles/journal_contribution/Area-Selective_Atomic_Layer_Deposition_of_Ruthenium_Using_a_Novel_Ru_Precursor_and_H_sub_2_sub_O_as_a_Reactant/14770857 LK http://dx.doi.org/https://doi.org/10.1021/acs.chemmater.0c04496.s001 DO https://doi.org/10.1021/acs.chemmater.0c04496.s001 SF ELIB - SuUB Bremen
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