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Cyclic Plasma Halogenation of Amorphous Carbon for Defect-F..:

Mikhail Krishtab (7828346) ; Silvia Armini (1853818) ; Johan Meersschaut (1604593)..
https://figshare.com/articles/journal_contribution/Cyclic_Plasma_Halogenation_of_Amorphous_Carbon_for_Defect-Free_Area-Selective_Atomic_Layer_Deposition_of_Titanium_Oxide/14828878. , 2021

Link: https://doi.org/10.1021/acsami.1c04405.s001

RT Journal
T1 <Title>Cyclic Plasma Halogenation of Amorphous Carbon for Defect-Free Area-Selective Atomic Layer Deposition of Titanium Oxide</Title>

UL https://suche.suub.uni-bremen.de/peid=base-ftsmithonian:oai:figshare.com:article_14828878&Exemplar=1&LAN=DE
				
A1 Mikhail Krishtab (7828346)
A1 Silvia Armini (1853818)
A1 Johan Meersschaut (1604593)
A1 Stefan De Gendt (8316330)
A1 Rob Ameloot (1420957)
YR 2021
K1 Medicine
K1 Cell Biology
K1 Biotechnology
K1 Developmental Biology
K1 Biological Sciences not elsewhere classified
K1 Chemical Sciences not elsewhere classified
K1 Physical Sciences not elsewhere classified
K1 understanding defect formation mech
K1 60 nm half-pitch line pattern
K1 ALD TiO 2 sequence
K1 plasma-treated SiO 2
K1 Cl 2 plasma forms
K1 deposition
K1 TiO 2 nuclei
K1 CF
K1 Cyclic Plasma Halogenation
K1 surface
K1 TiO 2
K1 Defect-Free Area-Selective Atomic L
K1 TiO 2 nucleation defects
K1 8 nm TiO 2 layer
JF https://figshare.com/articles/journal_contribution/Cyclic_Plasma_Halogenation_of_Amorphous_Carbon_for_Defect-Free_Area-Selective_Atomic_Layer_Deposition_of_Titanium_Oxide/14828878
LK http://dx.doi.org/https://doi.org/10.1021/acsami.1c04405.s001
DO https://doi.org/10.1021/acsami.1c04405.s001
SF ELIB - SuUB Bremen

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