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Dry-Etchable Molecular Layer-Deposited Inhibitor Using Anne..:

Seunghwan Lee (207004) ; Hye-Mi Kim (9307187) ; GeonHo Baek (9373080).
https://figshare.com/articles/journal_contribution/Dry-Etchable_Molecular_Layer-Deposited_Inhibitor_Using_Annealed_Indicone_Film_for_Nanoscale_Area-Selective_Deposition/17144620. , 2021

Link: https://doi.org/10.1021/acsami.1c16112.s001

RT Journal
T1 <Title>Dry-Etchable Molecular Layer-Deposited Inhibitor Using Annealed Indicone Film for Nanoscale Area-Selective Deposition</Title>

UL https://suche.suub.uni-bremen.de/peid=base-ftsmithonian:oai:figshare.com:article_17144620&Exemplar=1&LAN=DE
				
A1 Seunghwan Lee (207004)
A1 Hye-Mi Kim (9307187)
A1 GeonHo Baek (9373080)
A1 Jin-Seong Park (1534228)
YR 2021
K1 Biochemistry
K1 Medicine
K1 Cell Biology
K1 Biotechnology
K1 Evolutionary Biology
K1 Cancer
K1 Space Science
K1 Biological Sciences not elsewhere classified
K1 Chemical Sciences not elsewhere classified
K1 Physical Sciences not elsewhere classified
K1 thermal heat treatment
K1 creating improved overlay
K1 becoming extremely small
K1 3d trench structure
K1 highly conformal deposition
K1 chemical vapor deposition
K1 carbon film fabricated
K1 deposit conformal films
K1 molecular layer deposition
K1 annealed indicone film
K1 alucone film deposited
K1 annealed indicone surface
K1 indicone film deposited
K1 approximately 5 nm
K1 ru thin film
K1 etchable molecular layer
K1 annealed mld films
K1 area selective deposition
K1 indicone film
K1 selective deposition
K1 5 nm
K1 ru film
K1 selectively deposited
K1 mld films
K1 inhibiting layer
K1 wall surface
K1 working pressure
K1 technology node
K1 spin coating
K1 si line
K1 semiconductor production
K1 refractive index
K1 promising technique
K1 plasma power
K1 patterned substrate
K1 optimized according
K1 new strategy
K1 nanoscale area
K1 mld processes
K1 mld )
JF https://figshare.com/articles/journal_contribution/Dry-Etchable_Molecular_Layer-Deposited_Inhibitor_Using_Annealed_Indicone_Film_for_Nanoscale_Area-Selective_Deposition/17144620
LK http://dx.doi.org/https://doi.org/10.1021/acsami.1c16112.s001
DO https://doi.org/10.1021/acsami.1c16112.s001
SF ELIB - SuUB Bremen

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