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Epitaxial growth of silicon by PECVD from SiF4/H2/Ar gas mi..:
Leal, Ronan
http://www.theses.fr/2017SACLX038/document. , 2017
Link:
http://www.theses.fr/2017SACLX038/document
RT Journal T1
Epitaxial growth of silicon by PECVD from SiF4/H2/Ar gas mixtures for photovoltaics ; Croissance épitaxiale de silicium par PECVD à partir de SiF4/H2/Ar pour applications photovoltaïques
UL https://suche.suub.uni-bremen.de/peid=base-ftstarfr:2017SACLX038&Exemplar=1&LAN=DE A1 Leal, Ronan YR 2017 K1 Épitaxie basse température K1 Émetteur épitaxié K1 SiF4 K1 Silicium cristallin K1 Cellule solaire K1 Low-temperature epitaxy K1 PECVD K1 Epitaxial emitter K1 Crystalline silicon K1 Solar cell K1 548 JF http://www.theses.fr/2017SACLX038/document LK http://www.theses.fr/2017SACLX038/document DO http://www.theses.fr/2017SACLX038/document SF ELIB - SuUB Bremen
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