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1 Ergebnisse
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Investigation of defect formation and electronic transport ..:
Stöger, M
;
Breymesser, A
;
Schlosser, V
...
Versió postprint del document publicat a: http://dx.doi.org/10.1016/S0921-4526(99)00568-2. , 1999
Link:
http://hdl.handle.net/2445/47422
RT Journal T1 <Title>Investigation of defect formation and electronic transport in microcrystalline silicon deposited by hot-wire CVD</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftubarcepubl:oai:diposit.ub.edu:2445_47422&Exemplar=1&LAN=DE A1 Stöger, M A1 Breymesser, A A1 Schlosser, V A1 Ramadori, M A1 Plunger, V A1 Peiró, D A1 Voz Sánchez, Cristóbal A1 Bertomeu i Balagueró, Joan A1 Nelhiebel, M A1 Schattschneider, P A1 Andreu i Batallé, Jordi PB Elsevier B.V. YR 1999 K1 Silici K1 Deposició química en fase vapor K1 Microscòpia electrònica de transmissió K1 Potenciometria K1 Nanotecnologia K1 Silicon K1 Chemical vapor deposition K1 Transmission electron microscopy K1 Potentiometry K1 Nanotechnology JF Versió postprint del document publicat a: http://dx.doi.org/10.1016/S0921-4526(99)00568-2 LK http://hdl.handle.net/2445/47422 DO http://hdl.handle.net/2445/47422 SF ELIB - SuUB Bremen
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