Lewis, Scott M ; DeRose, Guy A ; Alty, Hayden R...
Lewis , S M , DeRose , G A , Alty , H R , Hunt , M S , Lee , N , Mann , J A , Grindell , R , Wertheim , A , De Rose , L , Fernandez , A , Muryn , C A , Whitehead , G F S , Timco , G A , Scherer , A & Winpenny , R E P 2022 , ' Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography ' , Advanced Functional Materials , vol. 32 , no. 32 , 2202710 . https://doi.org/10.1002/adfm.202202710.  , 2022