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Recent Achievements in sub-10 nm DSA lithography for Line/S..:
Navarro, C
;
Nicolet, C
;
Ariura, F
...
info:eu-repo/semantics/altIdentifier/doi/10.2494/photopolymer.30.69. , 2017
Link:
https://hal.univ-grenoble-alpes.fr/hal-01825083
RT Journal T1 <Title>Recent Achievements in sub-10 nm DSA lithography for Line/Space patterning</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftunigrenoble:oai:HAL:hal-01825083v1&Exemplar=1&LAN=DE A1 Navarro, C A1 Nicolet, C A1 Ariura, F A1 Chevalier, X A1 Xu, K A1 Hockey, M. A A1 Mumtaz, M A1 Hadziioannou, G A1 Legrain, A A1 Zelsmann, M A1 Gharbi, A A1 Tiron, R A1 Pain, L A1 Evangelio, L A1 Fernández-Regúlez, M A1 Pérez-Murano, F A1 Cayrefourcq, I PB HAL CCSD; Technical Assoc of Photopolymers Japan YR 2017 K1 [PHYS]Physics [physics] JF info:eu-repo/semantics/altIdentifier/doi/10.2494/photopolymer.30.69 LK http://dx.doi.org/https://hal.univ-grenoble-alpes.fr/hal-01825083 DO https://hal.univ-grenoble-alpes.fr/hal-01825083 SF ELIB - SuUB Bremen
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