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1 Ergebnisse
1
Focused helium and neon ion beam induced etching for advanc..:
Gonzalez, Carlos M
;
Timilsina, Rajendra
;
Li, Guoliang
...
https://research.rug.nl/en/publications/08c12912-2ce0-4a2c-94fb-36c9f2ab9ea8. , 2014
Link:
https://hdl.handle.net/11370/08c12912-2ce0-4a2c-94fb-3..
RT Journal T1
Focused helium and neon ion beam induced etching for advanced extreme ultraviolet lithography mask repair
UL https://suche.suub.uni-bremen.de/peid=base-ftunigroningenpu:oai:pure.rug.nl:publications_08c12912-2ce0-4a2c-94fb-36c9f2ab9ea8&Exemplar=1&LAN=DE A1 Gonzalez, Carlos M A1 Timilsina, Rajendra A1 Li, Guoliang A1 Duscher, Gerd A1 Rack, Philip D A1 Slingenbergh, Winand A1 van Dorp, Willem F A1 De Hosson, Jeff T. M A1 Klein, Kate L A1 Wu, Huimeng M A1 Stern, Lewis A YR 2014 K1 MO/SI MULTILAYER MIRRORS K1 RU BARRIER LAYER K1 X-RAY MIRRORS K1 ELECTRON-BEAM K1 INDUCED DEPOSITION K1 THERMAL-STABILITY K1 STRESS K1 ENHANCEMENT K1 FABRICATION K1 COATINGS JF https://research.rug.nl/en/publications/08c12912-2ce0-4a2c-94fb-36c9f2ab9ea8 LK http://dx.doi.org/https://hdl.handle.net/11370/08c12912-2ce0-4a2c-94fb-36c9f2ab9ea8 DO https://hdl.handle.net/11370/08c12912-2ce0-4a2c-94fb-36c9f2ab9ea8 SF ELIB - SuUB Bremen
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