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1 Ergebnisse
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Investigation of Plasma Deposited Boron Phosphide and Its C..:
Maksimova, Alina
;
Uvarov, Alexander
;
Baranov, Artem
...
info:eu-repo/semantics/altIdentifier/doi/10.1021/acsaem.1c02704. , 2022
Link:
https://hal.science/hal-03832802
RT Journal T1
Investigation of Plasma Deposited Boron Phosphide and Its Contact to Silicon
UL https://suche.suub.uni-bremen.de/peid=base-ftuniparissaclay:oai:HAL:hal-03832802v1&Exemplar=1&LAN=DE A1 Maksimova, Alina A1 Uvarov, Alexander A1 Baranov, Artem A1 Gudovskikh, Alexander A1 Kudryashov, Dmitri A1 Vyacheslavova, Ekaterina A1 Morozov, Ivan A1 Le Gall, Sylvain A1 Kleider, Jean-Paul PB HAL CCSD; ACS YR 2022 K1 Semiconductors K1 Solar cells K1 silicon K1 selective contacts K1 PECVD K1 boron phosphide K1 [SPI.MAT]Engineering Sciences [physics]/Materials K1 [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics JF info:eu-repo/semantics/altIdentifier/doi/10.1021/acsaem.1c02704 LK http://dx.doi.org/https://hal.science/hal-03832802 DO https://hal.science/hal-03832802 SF ELIB - SuUB Bremen
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