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1 Ergebnisse
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Epitaxial growth of silicon by PECVD from SiF4/H2/Ar gas mi..:
Leal, Ronan
NNT: 2017SACLX038. , 2017
Link:
https://theses.hal.science/tel-02969502
RT Journal T1
Epitaxial growth of silicon by PECVD from SiF4/H2/Ar gas mixtures for photovoltaics ; Croissance épitaxiale de silicium par PECVD à partir de SiF4/H2/Ar pour applications photovoltaïques
UL https://suche.suub.uni-bremen.de/peid=base-ftuniparissaclay:oai:HAL:tel-02969502v1&Exemplar=1&LAN=DE A1 Leal, Ronan PB HAL CCSD YR 2017 K1 Low-temperature epitaxy K1 PECVD K1 Epitaxial emitter K1 SiF4 K1 Crystalline silicon K1 Solar cell K1 Épitaxie basse température K1 Émetteur épitaxié K1 Silicium cristallin K1 Cellule solaire K1 [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci] JF NNT: 2017SACLX038 LK http://dx.doi.org/https://theses.hal.science/tel-02969502 DO https://theses.hal.science/tel-02969502 SF ELIB - SuUB Bremen
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