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1 Ergebnisse
1
Nanocluster-Based Ultralow-Temperature Driven Oxide Gate Di..:
Jo, Jeong-Wan
;
Kang, Jingu
;
Kim, Kyung-Tae
...
https://www.repository.cam.ac.uk/handle/1810/317987. , 2020
Link:
https://www.repository.cam.ac.uk/handle/1810/317987
RT Journal T1
Nanocluster-Based Ultralow-Temperature Driven Oxide Gate Dielectrics for High-Performance Organic Electronic Devices
UL https://suche.suub.uni-bremen.de/peid=base-ftunivcam:oai:www.repository.cam.ac.uk:1810_317987&Exemplar=1&LAN=DE A1 Jo, Jeong-Wan A1 Kang, Jingu A1 Kim, Kyung-Tae A1 Kang, Seung-Han A1 Shin, Jae-Cheol A1 Shin, Seung Beom A1 Kim, Yong-Hoon A1 Park, Sung Kyu PB MDPI AG; http://dx.doi.org/10.3390/ma13235571; Materials (Basel) YR 2020 K1 deep ultraviolet (DUV) photochemical activation K1 low-temperature process K1 organic thin-film transistor K1 single-crystal organic semiconductor K1 solution-processed metal-oxide gate dielectrics JF https://www.repository.cam.ac.uk/handle/1810/317987 LK http://dx.doi.org/https://www.repository.cam.ac.uk/handle/1810/317987 DO https://www.repository.cam.ac.uk/handle/1810/317987 SF ELIB - SuUB Bremen
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