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Deposition temperature dependence of material and Si surfac..:
Bordihn, S Stefan
;
Mertens, V
;
Müller, JW
.
ISSN:0734-2101. , 2014
Link:
http://repository.tue.nl/766279
RT Journal T1
Deposition temperature dependence of material and Si surface passivaion properties of O3-based atomic layer deposited Al2O3-based films and stacks
UL https://suche.suub.uni-bremen.de/peid=base-ftuniveindhoven:oai:library.tue.nl:766279&Exemplar=1&LAN=DE A1 Bordihn, S Stefan A1 Mertens, V A1 Müller, JW A1 Kessels, WMM Erwin YR 2014 JF ISSN:0734-2101 LK http://repository.tue.nl/766279 DO http://repository.tue.nl/766279 SF ELIB - SuUB Bremen
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