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Impact of the low temperature operation on long channel str..:
De Oliveira, Alberto Vinicius
;
Simoen, Eddy
;
Der Agopian, Paula Ghedini
...
2016 SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2016. , 2017
Link:
http://hdl.handle.net/11449/169422
RT Journal T1
Impact of the low temperature operation on long channel strained Ge pFinFETs fabricated with STI first and last processes
UL https://suche.suub.uni-bremen.de/peid=base-ftunivespir:oai:repositorio.unesp.br:11449_169422&Exemplar=1&LAN=DE A1 De Oliveira, Alberto Vinicius A1 Simoen, Eddy A1 Der Agopian, Paula Ghedini A1 Martino, João Antonio A1 Mitard, Jérôme A1 Witters, Liesbeth A1 Collaert, Nadine A1 Thean, Aaron A1 Claeys, Cor YR 2017 K1 Ge pFinFET K1 long strained device K1 low temperature operation K1 STI first K1 STI last JF 2016 SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2016 LK http://hdl.handle.net/11449/169422 DO http://hdl.handle.net/11449/169422 SF ELIB - SuUB Bremen
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