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1 Ergebnisse
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Nanoporous SiO 2 / Si thin layers produced by ion track etc..:
Dallanora, Arícia Oliveira
;
Marcondes, Tatiana Lisbôa
;
Bermudez, Gerardo
...
Journal of applied physics. Melville, NY. Vol. 104, no. 2 (July 2008), p. 024307-1 a 024307-8. , 2008
Link:
http://hdl.handle.net/10183/117995
RT Journal T1 <Title>Nanoporous SiO 2 / Si thin layers produced by ion track etching : dependence on the ion energy and criterion for etchability</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftunivfrgs:oai:lume.ufrgs.br:10183_117995&Exemplar=1&LAN=DE A1 Dallanora, Arícia Oliveira A1 Marcondes, Tatiana Lisbôa A1 Bermudez, Gerardo A1 Fichtner, Paulo Fernando Papaleo A1 Trautmann, C A1 Toulemonde, M A1 Papaleo, Ricardo Meurer YR 2008 K1 Íons K1 Eletrodeposição K1 Dióxido de silício JF Journal of applied physics. Melville, NY. Vol. 104, no. 2 (July 2008), p. 024307-1 a 024307-8 LK http://hdl.handle.net/10183/117995 DO http://hdl.handle.net/10183/117995 SF ELIB - SuUB Bremen
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