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1 Ergebnisse
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Copper gettering at half the projected ion range induced by..:
Fichtner, Paulo Fernando Papaleo
;
Behar, Moni
;
Kaschny, Jorge Ricardo de Araujo
...
Applied physics letters. Melville. Vol. 77, no. 7 (Aug. 2000), p. 972-974. , 2000
Link:
http://hdl.handle.net/10183/141127
RT Journal T1
Copper gettering at half the projected ion range induced by low-energy channeling He implantation into silicon
UL https://suche.suub.uni-bremen.de/peid=base-ftunivfrgs:oai:www.lume.ufrgs.br:10183_141127&Exemplar=1&LAN=DE A1 Fichtner, Paulo Fernando Papaleo A1 Behar, Moni A1 Kaschny, Jorge Ricardo de Araujo A1 Peeva, Anita A1 Koegler, Reinhard A1 Skorupa, Wolfgang YR 2000 K1 Hélio K1 Cobre K1 Silício K1 Tunelamento K1 Espectroscopia de massa de ions secundarios K1 Implantação de íons K1 Perda de energia de particulas K1 Recozimento K1 Semicondutores K1 Impurezas K1 Retroespalhamento rutherford K1 Dopagem de semicondutores K1 Microscopia eletrônica de transmissão JF Applied physics letters. Melville. Vol. 77, no. 7 (Aug. 2000), p. 972-974 LK http://hdl.handle.net/10183/141127 DO http://hdl.handle.net/10183/141127 SF ELIB - SuUB Bremen
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