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Photo-Assisted Etching in Halogen Containing Plasmas:

Sridhar, Shyam
Portions of this document appear in: Zhu, Weiye, Shyam Sridhar, Lei Liu, Eduardo Hernandez, Vincent M. Donnelly, and Demetre J. Economou. "Photo-assisted etching of silicon in chlorine-and bromine-containing plasmas." Journal of Applied Physics 115, no. 20 (2014): 203303. DOI:10.1063/1.4878895..  , 2016