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Critical Level of Nitrogen Incorporation in Silicon Oxynitr..:

Topka, Konstantina ; Diallo, Babacar ; Puyo, Maxime...
info:eu-repo/semantics/altIdentifier/doi/10.1021/acsaelm.2c00018. , 2022

Link: https://hal.science/hal-03657402

RT Journal
T1 <Title>Critical Level of Nitrogen Incorporation in Silicon Oxynitride Films: Transition of Structure and Properties, toward Enhanced Anticorrosion Performance</Title>

UL https://suche.suub.uni-bremen.de/peid=base-ftunivorleans:oai:HAL:hal-03657402v1&Exemplar=1&LAN=DE
				
A1 Topka, Konstantina
A1 Diallo, Babacar
A1 Puyo, Maxime
A1 Papavasileiou, Paris
A1 Lebesgue, Charlotte
A1 Genevois, Cecile
A1 Tison, Yann
A1 Charvillat, Cedric
A1 Samelor, Diane
A1 Laloo, Raphael
A1 Sadowski, Daniel
A1 Senocq, François
A1 Sauvage, Thierry
A1 Vergnes, Hugues
A1 Menu, Marie-Joelle
A1 Caussat, Brigitte
A1 Turq, Viviane
A1 Pellerin, Nadia
A1 Vahlas, Constantin
PB HAL CCSD; American Chemical Society
YR 2022
K1 silicon oxynitride
K1 tris(dimethylsilyl)amine
K1 chemical vapor deposition
K1 buffer oxide etchant
K1 hydrolysis resistance
K1 thin film
K1 material network
K1 wet etching corrosion
K1 [CHIM.MATE]Chemical Sciences/Material chemistry
JF info:eu-repo/semantics/altIdentifier/doi/10.1021/acsaelm.2c00018
LK http://dx.doi.org/https://hal.science/hal-03657402
DO https://hal.science/hal-03657402
SF ELIB - SuUB Bremen

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