I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
Sputtered Ultrathin WO 3 for Realizing Room-Temperature Hig..:
Yu-Chuan Chiu
;
Moumita Deb
;
Po-Tsun Liu
...
doi:10.1021/acsaelm.3c00725.s001. , 2023
Link:
https://doi.org/10.1021/acsaelm.3c00725.s001
RT Journal T1
Sputtered Ultrathin WO 3 for Realizing Room-Temperature High-Sensitive NO 2 Gas Sensors
UL https://suche.suub.uni-bremen.de/peid=base-ftunivoxfordfig:oai:figshare.com:article_24492323&Exemplar=1&LAN=DE A1 Yu-Chuan Chiu A1 Moumita Deb A1 Po-Tsun Liu A1 Hsiao-Wen Zan A1 Yun-Ru Shih A1 Yue Kuo A1 Dun-Bao Ruan A1 Kai-Jhih Gan A1 Chih-Chieh Hsu YR 2023 K1 Biological Sciences not elsewhere classified K1 Chemical Sciences not elsewhere classified K1 μm line width K1 panel display technology K1 good enough selectivity K1 semiconductor gas sensor K1 level crystal together K1 68 ppm ) K1 detect 100 ppb K1 commercial manufacturing process K1 almost unchanged response K1 3 </ sub K1 2 </ sub K1 100 ppb ) K1 sputtered ultrathin wo K1 gas sensors K1 17 ppm K1 sputtering process K1 sensing response K1 nanometer process K1 fast response K1 ultrathin thickness K1 surface roughness K1 suitable control K1 sensing layer K1 room temperature K1 relative humidity K1 realizing room K1 postannealing condition K1 nondecayed sensing K1 level detection K1 humidity effect K1 heating setup K1 film resistor K1 deposition condition K1 deposition ambient K1 current flat K1 crystalline condition K1 also discussed K1 70 % K1 5 nm K1 14 days K1 /∼ 21 JF doi:10.1021/acsaelm.3c00725.s001 LK http://dx.doi.org/https://doi.org/10.1021/acsaelm.3c00725.s001 DO https://doi.org/10.1021/acsaelm.3c00725.s001 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)