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1 Ergebnisse
1
FinFET Versus Gate-All-Around Nanowire FET: Performance, Sc..:
Nagy, Daniel
;
Indalecio Fernández, Guillermo
;
García Loureiro, Antonio Jesús
..
https://doi.org/10.1109/JEDS.2018.2804383. ,
Link:
http://hdl.handle.net/10347/22457
RT Journal T1
FinFET Versus Gate-All-Around Nanowire FET: Performance, Scaling, and Variability
UL https://suche.suub.uni-bremen.de/peid=base-ftunivsantcomp:oai:minerva.usc.es:10347_22457&Exemplar=1&LAN=DE A1 Nagy, Daniel A1 Indalecio Fernández, Guillermo A1 García Loureiro, Antonio Jesús A1 Elmessary, Muhammad A A1 Seoane Iglesias, Natalia PB IEEE K1 Drift-diffusion (DD) K1 Monte Carlo (MC) simulations K1 Density gradient (DG) quantum corrections K1 Schrödinger equation based quantum corrections K1 Si FinFET K1 Gate-all-around (GAA) nanowire (NW) FET K1 Metal grain granularity (MGG) K1 Line edge roughness (LER) JF https://doi.org/10.1109/JEDS.2018.2804383 LK http://hdl.handle.net/10347/22457 DO http://hdl.handle.net/10347/22457 SF ELIB - SuUB Bremen
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