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Modification of Weak Localization in Metallic Thin Films Du..:
Ozeri, Meital
;
Xu, Jiahui
;
Bauer, Gilad
...
Journal of Physical Chemistry Letters, 1948-7185, 2023, 14:21, s. 4941-4948. , 2023
Link:
http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-507453
RT Journal T1
Modification of Weak Localization in Metallic Thin Films Due to the Adsorption of Chiral Molecules
UL https://suche.suub.uni-bremen.de/peid=base-ftuppsalauniv:oai:DiVA.org:uu-507453&Exemplar=1&LAN=DE A1 Ozeri, Meital A1 Xu, Jiahui A1 Bauer, Gilad A1 Olde Olthof, Linde A. B A1 Kimbell, Graham A1 Wittmann, Angela A1 Yochelis, Shira A1 Fransson, Jonas A1 Robinson, Jason W. A A1 Paltiel, Yossi A1 Millo, Oded PB Uppsala universitet, Materialteori; Hebrew Univ Jerusalem, Racah Inst Phys, IL-9190401 Jerusalem, Israel.;Hebrew Univ Jerusalem, Ctr Nanosci & Nanotechnol, IL-9190401 Jerusalem, Israel.; Univ Cambridge, Dept Mat Sci & Met, Cambridge CB3 0FS, England.; Hebrew Univ Jerusalem, Ctr Nanosci & Nanotechnol, IL-9190401 Jerusalem, Israel.;Hebrew Univ Jerusalem, Appl Phys Dept, IL-9190401 Jerusalem, Israel.; Johannes Gutenberg Univ Mainz, Inst Phys, D-55128 Mainz, Germany. YR 2023 K1 Condensed Matter Physics K1 Den kondenserade materiens fysik JF Journal of Physical Chemistry Letters, 1948-7185, 2023, 14:21, s. 4941-4948 LK http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-507453 DO http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-507453 SF ELIB - SuUB Bremen
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