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Nanoscale dielectric properties of TiO2 in SiO2 nanocomposi..:
Villeneuve-Faure, C
;
Mitronika, Maria
;
Dan, A, P
...
info:eu-repo/semantics/altIdentifier/doi/10.1088/2632-959x/ad220d. , 2024
Link:
https://hal.science/hal-04549301
RT Journal T1 <Title>Nanoscale dielectric properties of TiO2 in SiO2 nanocomposite deposited by hybrid PECVD method</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftutoulouse3hal:oai:HAL:hal-04549301v1&Exemplar=1&LAN=DE A1 Villeneuve-Faure, C A1 Mitronika, Maria A1 Dan, A, P A1 Boudou, Laurent A1 Ravisy, William A1 Besland, M, P A1 Richard-Plouet, Mireille A1 Goullet, Antoine PB HAL CCSD YR 2024 K1 TiO2-SiO2 nanocomposite thin films K1 atomic force microscopy K1 low-pressure plasma processing K1 dielectric thin films K1 [CHIM.MATE]Chemical Sciences/Material chemistry K1 [PHYS]Physics [physics] JF info:eu-repo/semantics/altIdentifier/doi/10.1088/2632-959x/ad220d LK http://dx.doi.org/https://hal.science/hal-04549301 DO https://hal.science/hal-04549301 SF ELIB - SuUB Bremen
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