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1 Ergebnisse
1
Silicidation process: Modelling nickel deposition and diffu..:
Jara Donoso, César
tel-04196856. , 2023
Link:
https://laas.hal.science/tel-04196856
RT Journal T1
Silicidation process: Modelling nickel deposition and diffusion from silicide/silicon interfaces through ab initio calculations and machine learning approach ; Procédé de siliciuration : Modélisation du dépôt et de la diffusiondu nickel à partir des interfaces siliciure/silicium par des calculsab initio et une approche d'apprentissage automatique
UL https://suche.suub.uni-bremen.de/peid=base-ftutoulouse3hal:oai:HAL:tel-04196856v1&Exemplar=1&LAN=DE A1 Jara Donoso, César PB HAL CCSD YR 2023 K1 AB INITIO CALCULATION K1 MACHINE LEARNING K1 INTERATOMIC POTENTIAL K1 SILICIDATION K1 SILICIDE K1 ALLOY K1 NICKEL K1 CALCUL AB INITIO K1 POTENTIEL INTERATOMIQUE K1 SILICIURATION K1 SILICIURE K1 ALLIAGE K1 [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics JF tel-04196856 LK http://dx.doi.org/https://laas.hal.science/tel-04196856 DO https://laas.hal.science/tel-04196856 SF ELIB - SuUB Bremen
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